BREAKING 🇨🇳

China has reportedly built a prototype extreme ultraviolet (EUV) lithography machine, a key tool for advanced chipmaking (Reuters).

If validated, this marks a major step in China’s push for semiconductor self-sufficiency after a six-year state-backed program. The system is said to generate EUV light and is currently under testing, with commercial readiness targeted between 2028–2030.

ASML remains the only proven EUV supplier today, but this development signals China’s intent to reduce reliance on U.S.-linked supply chains.

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